Author:
Randall John,Gangala Hareen,Tritchkov Alexander
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. Mathematical and CAD framework for proximity correction
2. Experimental results on optical proximity correction with variable-threshold resist model
3. A. Tritchkov, J. Stiriman, K. Ronse, Luc Vab den hove, “180nm KrF lithography using OPC based on empirical behavior modeling”. Presented at EIPBN'99 in Chicago, to be published JVSTB.
Cited by
13 articles.
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