Sub-Resolution Assist Feature in Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography
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Published:2016-09-01
Issue:9
Volume:8
Page:739-743
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ISSN:1941-4900
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Container-title:Nanoscience and Nanotechnology Letters
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language:en
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Short-container-title:Nanosci Nanotechnol Lett
Author:
Kim Jung Sik,Hong Seongchul,Jang Yong Ju,Ahn Jinho
Publisher
American Scientific Publishers
Subject
General Materials Science