Author:
Gusev E.P,Cartier E,Buchanan D.A,Gribelyuk M,Copel M,Okorn-Schmidt H,D’Emic C
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference39 articles.
1. Scaling the gate dielectric: Materials, integration, and reliability
2. M.L. Green, E.P. Gusev, R. Degraeve, E. Garfunkel, J. Appl. Phys. (Review) 90 (2001), in press.
3. Ultrathin oxide films for advanced gate dielectrics applications: recent progress and future challenges;Gusev,2000
4. Structure and stability of ultrathin zirconium oxide layers on Si(001)
5. Physical characterization of ultrathin films of high dielectric constant materials on silicon;Gusev,2000
Cited by
330 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献