Author:
Schiavone Patrick,Granet Gérard,Robic J.Y.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
28 articles.
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1. Cyclegan-Based Mask Diffraction Model;2023 China Semiconductor Technology International Conference (CSTIC);2023-06-26
2. Fast aerial image model for EUV lithography using the adjoint fully convolutional network;Optics Express;2022-03-25
3. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022
4. Investigation of waveguide modes in EUV mask absorbers;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-20
5. Fast mask near-field calculation using fully convolution network;2020 International Workshop on Advanced Patterning Solutions (IWAPS);2020-11-05