Fast mask near-field calculation using fully convolution network-Reference-Cited by-同舟云学术

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Fast mask near-field calculation using fully convolution network

Published:2020-11-05 Issue: Volume: Page:
ISSN:
Container-title:2020 International Workshop on Advanced Patterning Solutions (IWAPS)
language:
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Author:

Lin Jiaxin,Dong Lisong,Fan Taian,Ma Xu,Chen Rui,Wei Yayi

Funder

National Science and Technology Major Project of China

National Natural Science Foundation of China (NSFC)

Beijing Municipal Natural Science Foundation

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9286788/9286789/09286805.pdf?arnumber=9286805

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 3D EUV mask simulator based on physics-informed neural networks: effects of polarization and illumination;Computational Optics 2024;2024-06-17

2. Pre-training CNN for fast EUV lithography simulation including M3D effects;DTCO and Computational Patterning III;2024-04-10

3. 3d mask simulation and lithographic imaging using physics-informed neural networks;Optical and EUV Nanolithography XXXVII;2024-04-10

4. Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-01-02

5. Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network;Optics Express;2023-07-11

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