Author:
Dentinger Paul M.,Krafcik Karen L.,Simison Kelby L.,Janek Richard P.,Hachman John
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography;Becker;Microelectron. Eng.,1986
2. Galvanoplated 3D structures for micro systems;Loechel;Microelectron. Eng.,1994
3. Application of ultraviolet depth lithography for surface micromachining;Loechel;J. Vacuum Sci. Technol. B,1995
4. J.D. Gelorme, R.J. Cox, S.A.R. Gutierrez, US (November 21 1989).
5. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications;Despont,1997
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