Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. http://notes.sematech.org/1999_SIA_Roadmap/Home.htm
2. Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I
3. Optical-constant tunable (ZrO[sub 2])[sub x]/(Cr[sub 2]O[sub 3])[sub y]/(Al[sub 2]O[sub 3])[sub 1−x−y] optical superlattices for attenuated phase shift mask in ArF lithography
4. C.D. Wangner, W.M. Riggs, L.E. Davis, J.F. Moulder, G.E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Minnesota, 1978.
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