Recent progress in cell-projection electron-beam lithography-Reference-Cited by-同舟云学术

Recent progress in cell-projection electron-beam lithography

Published:2003-06 Issue: Volume:67-68 Page:78-86
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Sohda Y,Ohta H,Murai F,Yamamoto J,Kawano H,Satoh H,Itoh H

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Electron-beam cell-projection lithography system

2. H. Kawano, H. Ito, T. Matsuzaka, N. Saitou, H. Oota, Y. Sohda, to be published in Proceedings of the 46th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication.

3. Y. Sohda, H. Itoh, Y. Someda, Y. Nakayama, H. Satoh, G. Matsuoka, Japanese patent P3274212.

4. New detection method for the 2-dimensional beam shape

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