A new nanocomposite resist for low and high voltage electron beam lithography-Reference-Cited by-同舟云学术

A new nanocomposite resist for low and high voltage electron beam lithography

Published:2003-10 Issue:1 Volume:70 Page:19-29
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Azam Ali M.,Gonsalves Kenneth E.,Agrawal Ankur,Jeyakumar Augustin,Henderson Clifford L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Low voltage electron beam lithography in PMMA

2. LEEPL Magazine-‘Next Generation Low-Cost Electron Beam Lithography Fabrication Technology’, 2002. http://www.sony.net/Products/SC-HP/CXPAL/CXNEWS-29/PDF/Mask_f.pdf

3. Organic–Inorganic Nanocomposites: Unique Resists for Nanolithography

4. K.E. Gonsalves, US and Int. Patents (2001 and 2002). Pending # 09-992560.

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