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2. Projected Range Statistics-Semiconductors and Related Materials;Gibbons,1975
3. Ion Implantation Range Data for Silicon and Germanium Device Technologies;Smith,1977
4. “High Dose Implantation into Photoresist”;Okuyama;J. Electrochem. Soc.,1978
5. “Improved Dry Etching Resistance of Electron-Beam Resist by Ion Exposure Process”;Mochiji;J. Electrochem. Soc.,1982