Hardware and power management for high power impulse magnetron sputtering
Author:
Publisher
Elsevier
Reference80 articles.
1. Dual-magnetron open field sputtering system for sideways deposition of thin films;Aijaz;Surface and Coatings Technology,2010
2. High power impulse magnetron sputtering: current–voltage–time characteristics indicate the onset of sustained self-sputtering;Anders;Journal of Applied Physics,2007
3. Efficient, compact power supply for repetitively pulsed, “triggerless” cathodic arcs;Anders;Review of Scientific Instruments,1999
4. On the HiPIMS benefits of multi-pulse operating mode;Antonin;Journal of Physics D: Applied Physics,2015
5. Fundamentals of Power Semiconductor Devices;Baliga,2008
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Preparation of Ta/Nb Coatings on the Inner Surface of 30 Mm Barrels by High-Power Magnetron Sputtering;2024
2. Synergistic effect of deposition temperature and substrate bias on structural, mechanical, stability and adhesion of TiN thin film prepared by reactive HiPIMS;Ceramics International;2023-12
3. Industrial application potential of high power impulse magnetron sputtering for wear and corrosion protection coatings;Journal of Applied Physics;2023-10-23
4. Инструментальные покрытия на основе TiAlN, полученные среднечастотным импульсным магнетронным распылением;STANKOINSTRUMENT Russia;2023-08-04
5. Foundations of physical vapor deposition with plasma assistance;Plasma Sources Science and Technology;2022-08-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3