Development of cloud-based automatic virtual metrology system for semiconductor industry-Reference-Cited by-同舟云学术

Development of cloud-based automatic virtual metrology system for semiconductor industry

Published:2015-08 Issue: Volume:34 Page:30-43
ISSN:0736-5845
Container-title:Robotics and Computer-Integrated Manufacturing
language:en
Short-container-title:Robotics and Computer-Integrated Manufacturing

Author:

Huang Hsien-Cheng,Lin Yu-Chuan,Hung Min-Hsiung,Tu Chia-Chun,Cheng Fan-Tien

Funder

Ministry of Science and Technology (MOST)

Advanced Institute of Manufacturing with High-tech Innovations (AIM-HI)

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,General Mathematics,Software,Control and Systems Engineering

Reference27 articles.

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2. Feasibility evaluation of virtual metrology for the example of a trench etch process,;Roeder;IEEE Trans. Semicond. Manuf.,2014

3. Development of an AVM system implementation framework;Hung;IEEE Trans. Semicond. Manuf.,2012

4. O. Rothe, ISMI Next Generation Factory, e-Manufacturing Workshop, SEMICON West 2008, USA, July, 2008. Available from: 〈http://www.sematech.org/meetings/archives/emanufacturing/8546/01-NGF.pdf〉.

5. J. Moyne,, International Technology Roadmap for Semiconductors (ITRS) Perspective on AEC/APC, in: ISMI AEC/APC Symposium XXI-North America, 2009, Ann Arbor, Michigan USA, Sepyember 2009.

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