Optimum design of a large area, flexure based XYθ mask alignment stage for a 12-inch wafer using grey relation analysis

Author:

Lee Changkyu,Lee Jae Woong,Ryu Sang Gil,Oh Je Hoon

Funder

WC300 R&D

Small and Medium Business Administration

Korea Institute of Energy Technology Evaluation and Planning

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,General Mathematics,Software,Control and Systems Engineering

Reference27 articles.

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2. A newly developed linear motor-driven aerostatic X-Y planar motion table system for nano-machining;Shinno;Ann. CIRP,2007

3. Scanning digital lithography providing high speed large area patterning with diffraction limited submicron resolution;Wen;J. Micromech. Microeng.,2018

4. Design and analysis of a novel flexure-based 3-DOF mechanism;Bhagat;Mech. Mach. Theory,2014

5. Development of a compact aperture-type XYθz positioning stage;Park;Rev. Sci. Instrum.,2016

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