Investigation of the performance of 248 nm excimer laser assisted photoresist removal process in gaseous media by response surface methodology and artificial neural network-Reference-Cited by-同舟云学术

Investigation of the performance of 248 nm excimer laser assisted photoresist removal process in gaseous media by response surface methodology and artificial neural network

Published:2019-02 Issue: Volume:38 Page:516-529
ISSN:1526-6125
Container-title:Journal of Manufacturing Processes
language:en
Short-container-title:Journal of Manufacturing Processes

Author:

Jacob James,Shanmugavelu P.,Balasubramaniam R.

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Management Science and Operations Research,Strategy and Management

Reference24 articles.

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