Identification of Important Parameters for Laser Photoresist Removal Process by ANFIS Methodology
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Publisher
Springer International Publishing
Link
https://link.springer.com/content/pdf/10.1007/978-3-030-88465-9_23
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3. Sathiamoorthy, S., Tiwari, K.J., Devi, G.R., Rao, M.R., Malar, P.: Photoresist template fabrication and template assisted growth for surface patterning of technologically important Cu2ZnSnSe4 thin films. Mater. Design 127, 126–133 (2017)
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