Deterministic control of material removal distribution to converge surface figure in full-aperture polishing-Reference-Cited by-同舟云学术

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Deterministic control of material removal distribution to converge surface figure in full-aperture polishing

Published:2020-05 Issue: Volume:53 Page:144-152
ISSN:1526-6125
Container-title:Journal of Manufacturing Processes
language:en
Short-container-title:Journal of Manufacturing Processes

Author:

Liao Defeng,Zhang Feihu,Xie Ruiqing,Zhao Shijie,Wang Jian,Xu Qiao

Funder

Science Challenge Project of China

Laboratory of Precision Manufacturing Technology, CAEP

Important National Science and Technology Specific Projects of China

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Management Science and Operations Research,Strategy and Management

Reference21 articles.

1. Toward deterministic material removal and surface figure during fused silica pad polishing;Suratwala;J Am Ceram Soc,2010

2. Optical polishing process: analysis and optimization using response surface methodology (RSM) for large diameter fused silica flat substrates;Singh;J Manuf Process,2017

3. The study of ultrasonic vibration assisted polishing optical glass lens with ultrasonic atomizing liquid;Yu;J Manuf Process,2018

4. Highly efficient polishing technology for glass substrates using tribo-chemical polishing with electrically controlled slurry;Ikeda;J Manuf Process,2013

5. Advanced technologies for fabrication and testing of large flat mirrors. Thesis (Ph.D.);Yellowhair,2007

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1. Research on High‐Efficiency Curved Surface Polishing with Even Distribution of Slurry Based on Dielectrophoresis;Advanced Engineering Materials;2024-03-20

2. 基于压力分布的环摆式双面抛光去除均匀性研究;Acta Optica Sinica;2024

3. Surface generating mechanism in surface shape error control for thin copper plate with large-diameter based on chemical mechanical lapping;Journal of Manufacturing Processes;2023-09

4. Monitoring of the glazing state of the pitch polishing lap by an image texture analysis method in full-aperture continuous polishing;Applied Optics;2023-06-02

5. 基于环摆式双面抛光法加工预测模型的去除均匀性研究;Acta Optica Sinica;2023

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