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Thermal Chemical Vapor Deposition

Published:1991 Issue: Volume: Page:283-368
ISSN:
Container-title:Thin Film Processes
language:
Short-container-title:

Author:

JENSEN KLAVS F.,KERN WERNER

Publisher

Elsevier

Reference547 articles.

1. “Thin Film Processes”;Kern,1978

2. “Deposition Technologies for Films and Coatings”;Blocher,1982

3. “Silicon Processing for the VLSI Era.”;Wolf,1987

4. “Chemical Vapor Deposition For Microelectronic.”;Sherman,1987

5. “Handbook of Thin-Film Deposition Processes and Techniques,”;Kern,1988

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A review of tribological properties and deposition methods for selected hard protective coatings;Tribology International;2022-12

2. Fundamentals of Oxide Manufacturing;Industrial Chemistry of Oxides for Emerging Applications;2018-03-25

3. Low Temperature Coating Deriving from Metal-Organic Precursors;Intelligent Coatings for Corrosion Control;2015

4. Nonequilibrium Atmospheric Plasma Deposition;Journal of Thermal Spray Technology;2011-03-24

5. Coordination Chemistry with Sterically Hindered Hydrotris(pyrazolyl)borate Ligands: Organometallic and Bioinorganic Perspectives;Progress in Inorganic Chemistry;2007-03-09

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