Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices

Published:2004-08 Issue:8 Volume:48 Page:1317-1323
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Isella G.,Chrastina D.,Rössner B.,Hackbarth T.,Herzog H.-J.,König U.,von Känel H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition;Rosenblad;J. Vac. Sci. Technol. A,1998

2. High-mobility Si and Ge structures;Schäffler;Semicond. Sci. Technol.,1997

3. Totally relaxed GexSi1−x layers with low threading dislocation densities grown on Si substrates;Fitzgerald;Appl. Phys. Lett.,1991

4. Strain relaxation and surface morphology of compositionally graded Si/Si1−xGex buffers;Li;J. Vac. Sci. Technol. B,1998

5. Alternatives to thick MBE-grown relaxed SiGe buffers;Hackbarth;Thin Solid Films,2000

Cited by 129 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanical and Lattice Thermal Properties of Si-Ge Lateral Heterostructures;Molecules;2024-08-12

2. High quality Ge layers for Ge/SiGe quantum well heterostructures using chemical vapor deposition;Physical Review Materials;2024-06-05

3. Strong coupling in metal-semiconductor microcavities featuring Ge quantum wells: a perspective study;Nanophotonics;2024-01-24

4. Electric-field induced modification of the photoluminescence polarization in Ge/Si0.15Ge0.85 quantum wells;Spintronics XVI;2023-09-28

5. Germanium wafers for strained quantum wells with low disorder;Applied Physics Letters;2023-08-28

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3