Van-der-Pauw measurement on devices with four contacts and two orthogonal mirror symmetries
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. A method of measuring specific resistivity and Hall effect of discs of arbitrary shape;van der Pauw;Philips Res Rep,1958
2. On the calculation of the geometric factor in a van der Pauw sheet resistance measurement;Chan;Rev Sci Instrum,2000
3. Analysis of symmetrical van der Pauw structures with finite contacts;Versnel;Solid-State Electron,1978
4. Effect of contact size and placement, and of resistive inhomogeneities on van der Pauw measurements;Koon;Rev Sci Instrum,1989
5. Measurement of contact placement errors in the van der Pauw technique;Koon;Rev Sci Instrum,1989
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