Author:
Molas Gabriel,Bocquet Marc,Buckley Julien,Grampeix Helen,Gély Marc,Colonna Jean-Philippe,Licitra Christophe,Rochat Névine,Veyront Thomas,Garros Xavier,Martin François,Brianceau Pierre,Vidal Vincent,Bongiorno Cosimo,Lombardo Salvatore,Salvo Barbara De,Deleonibus Simon
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. Alessandri M, Piagge R, Alberici S, Bellandi E, Caniatti M, Ghidini G. High-k materials in Flash memories. In: Proceedings of the 208th ECS Meeting; 2005.
2. High-k materials for nonvolatile memory applications;Houdt;IRPS Tech Dig,2005
3. Technology for sub-50nm DRAM and NAND Flash manufacturing;Kim;IEDM Tech Dig,2005
4. Non-volatile memory technologies for beyond 2010;Shin;VLSI Circuit Tech Dig,2005
5. Novel SiO2/AlN/HfAlO/IrO2 memory with fast erase, large DVth and good retention;Lai;VLSI Tech Dig,2005
Cited by
22 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献