Author:
Derenge M.A.,Jones K.A.,Kirchner K.W.,Ervin M.H.,Zheleva T.S.,Hullavarad S.,Vispute R.D.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
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5. Damage relaxation pre-activation anneal in Al-implanted SiC;Bahng;Mater. Sci. Forum,2003
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