Study of charge loss mechanisms for nano-sized localized trapping SONOS memory devices

Author:

Xu Yue,Yue Heng,Zhao Fei-Fei

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. On go with SONOS;Marvin;Circ Dev,2000

2. Shappir A, Lusky E, Cohen G, Eitan B. NROM window sensing for 2 and 4-bits per cell products. In: IEEE non-volatile semiconductor memory workshop (NVSMW); 2006. p. 68–69.

3. Tsai WJ, Zous NK, Liu CJ, Liu CC, Chen CH, Wang T, Pan S, Lu CY. Data retention of SONOS-type two-bit storage flash memory cell. In: International electron devices meeting, IEEE; 2001. p. 719–22.

4. Lue H-T, Hsiao Y-H, Shih Y-H, Lai E-K, Hsieh K-Y, Liu R, Lu C-Y. Study of charge loss mechanism of SONOS-type device using hot hole erase and methods to improve the charge retention. In: IEEE 44th annual international reliability physics symposium, San Jose, USA. March 2006. p. 523–29.

5. Hsiao Y-H, Lue H-T, Lee MY, Huang S-C, Chou T-Y, Wang S-Y, Hsieh K-Y, Liu R, Lu C-Y. A study of SONOS charge loss mechanism after hot-hole stressing using trap-layer engineering and electrical re-fill methods. In: IEEE 46th annual international reliability physics symposium, Phoenix, USA. October 2008. p. 695–96.

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