The creation of hydrogen radicals by the hot-wire technique and its application for μc-Si:H-Reference-Cited by-同舟云学术

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The creation of hydrogen radicals by the hot-wire technique and its application for μc-Si:H

Published:2001-02 Issue:1-4 Volume:66 Page:253-258
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Harada H,Yoshida N,Yamamoto K,Itoh T,Inagaki K,Inouchi H,Yamana N,Aoki T,Nonomura S,Nitta S

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?

2. Hydrogen Dilution Effect on the Crystallinity of Silicon Films Grow by Hot Wire Cell Method

3. Change in crystalline morphologies of polycrystalline silicon films prepared by radio‐frequency plasma‐enhanced chemical vapor deposition using SiF4+H2gas mixture at 350 °C

4. Glow-discharge amorphous silicon: Growth process and structure

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrolytic MnO2 via non-isothermal electrode heating: a promising approach for optimizing performances of electroactive materials;Journal of Power Sources;2004-01

2. Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films;Journal of Applied Physics;2002-02

3. Effect of r.f.-plasma assistance in hot-wire CVD on properties of μc-Si:H;Thin Solid Films;2001-09

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