Author:
Lee C,Gopalakrishnan R,Nyunt K,Wong A,Tan R.C.-E,Ong J.W.-L
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. The design of plasma etchants
2. Plasma-assisted etching
3. Plasma cleaning metal surfaces;O’Kane;J. Vacu. Sci. Technol.,1974
4. Korner N, Beck E, Dommann A, Ramm J. Hydrogen plasma chemical cleaning of metallic substrates and silicon wafers. In: Surface and Coatings Technology. Vols 76. Oxford: Elsevier Science, 1995. p. 731–737
5. Liston EM, Martinu L, Wertheimer MR. Plasma surface modification of polymers for improved adhesion: a critical review. Plasma Surface Modification of Polymers. VSP. 1994. p. 3–39
Cited by
26 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献