A strategy for characterization and evaluation of ESD robustness of CMOS semiconductor technologies

Author:

Voldman S,Anderson W,Ashton R,Chaine M,Duvvury C,Maloney T,Worley E

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. SIA National Technology Roadmap for Semiconductors, November 1997

2. SEMATECH Technology Transfer Document, Test structures for benchmarking the electrostatic discharge (ESD) robustness of CMOS technologies. SEMATECH TT 98013452A-TR, May 1998. http://www.sematech.org/public/docubase/abstract/tech-22.htm, http://notes.sematech.org/ntrs/Rdmpmem.nsf

3. Voldman S, Anderson W, Ashton R, Chaine M, Duvvury C, Maloney T, Worley E. ESD technology benchmarking strategy for evaluating electrostatic discharge robustness of CMOS technologies. Integrated Reliability Workshop (IRW) Proceedings, Integrated Reliability Workshop, Lake Tahoe, Nevada, October 12–16, 1998

4. Ashton R, Voldman S, Anderson W, Chaine M, Duvvury C, Maloney T, Worley E. Characterization of ESD robustness for CMOS technology. International Conference on Microelectronic Test Structures (ICMTS) Tutorial Short Course. International Conference on Microelectronics Test Structures, Sweden, February 1999

5. Determination of threshold failure levels of semiconductor diodes and transistors due to pulsed voltages;Wunsch;IEEE Trans Nucl Sci,1968

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