A study of nickel silicide film as a mechanical material-Reference-Cited by-同舟云学术

A study of nickel silicide film as a mechanical material

Published:2000-12 Issue:1-2 Volume:87 Page:90-95
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Qin Ming,Poon M.C,Yuen C.Y

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference17 articles.

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2. Silicon carbide as a mechanical material;Krotz,1995

3. Porous silicon — a new material for MEMS;Lehmann,1996

4. Compatibility of NiSi in the self-aligned silicide process for deep submicrometer devices;Mukai;Thin Solid Films,1995

5. Comparison of TiSi2, CoSi2 and NiSi for thin-film silicon-on-insulator applications;Chen;J. Electrochem. Soc.,1997

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