Patterning of nanometer-scale silicide structures on silicon by ‘direct writing focus ion-beam implantation’-Reference-Cited by-同舟云学术

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Patterning of nanometer-scale silicide structures on silicon by ‘direct writing focus ion-beam implantation’

Published:2002-05 Issue:2 Volume:411 Page:219-224
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Mitan M.M,Pivin D.P,Alford T.L,Mayer J.W

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. On the thermodynamical driving force during ion mixing of the Co‐Si system

2. Cobalt silicide formation by ion mixing

3. Formation of CoSi2 by ion beam mixing and rapid thermal annealing

4. Influence of oxide thickness on ion-beam induced and thermal CoSi2 formation

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1. Progress of superconducting nanofibers via electrospinning;Journal of Physics: Condensed Matter;2021-11-09

2. Using Anodic Aluminum Oxide Film and Nanoimprint to Produce Polymer Anti-counterfeit Labels;Smart Science;2017-06-06

3. Xenon-ion-induced and thermal mixing of Co/Si bilayers and their interplay;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2011-05

4. Engineering of Materials by Swift Heavy Ion Beam Mixing;Swift Heavy Ions for Materials Engineering and Nanostructuring;2011

5. MeV Au ion induced modifications at Co/Si interface;Applied Surface Science;2009-10

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