Author:
Cheng I-Chun,Wagner Sigurd
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference23 articles.
1. P.I. Hsu, M. Huang, S. Wagner, Z. Suo, J.C. Sturm, in: K.L. Jensen, R.J. Nemanich, P. Holloway, T. Trottier, W. Mackie, E. Temple, J. Itoh (Eds.), Electron-Emissive Materials, Vacuum Microelectronics and Flat-Panel Displays, San Francisco, USA, April 25–27, 2000, Materials Research Society Symposium Proceedings 621 (2000) Q8.6.1
2. An amorphous silicon thin film transistor fabricated at 125 °C by dc reactive magnetron sputtering
3. H. Gleskova, S. Wagner, Z. Suo, in: G. Parsons, T.S. Fahlen, S. Morozumi, C. Seager, C.-C. Tsai (Eds.), Flat-Panel Display Materials, San Francisco, USA, April 14–17, 1998, Materials Research Society Symposium Proceedings 508 (1998) 73
4. Amorphous silicon thin-film transistors on compliant polyimide foil substrates
5. 120 °C fabrication technology for a-Si:H thin film transistors on flexible polyimide substrates
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