Author:
Mohammed-Brahim Tayeb,Kandoussi Khalid,Belarbi Khaled,Lhermite Herve,Coulon Nathalie,Simon Claude
Abstract
The subthreshold slope of microcrystalline silicon Thin Film Transistor is shown to be highly improved when the thickness of the active layer is enough decreased. In the same manner, the threshold voltage of these TFTs with very thin active layer is shown to be controlled dynamically with high efficiency by a second gate in front of the first one. These behaviours are explained considering the similarities between these TFTs and fully depleted SOI-MOSFETs as well as with dual-gate SOI-MOSFETS.
Publisher
The Electrochemical Society
Cited by
2 articles.
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