Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties-Reference-Cited by-同舟云学术

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Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties

Published:1996-10 Issue:1-2 Volume:287 Page:115-119
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kawamura M.,Abe Y.,Yanagisawa H.,Sasaki K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Applications of TiN thin films in silicon device technology

2. Advanced metallization of very-large-scale integration devices

3. The microstructure of reactively sputtered Ti-N films

4. The effects of substrate bias on the structural and electrical properties of TiN films prepared by reactive r.f. sputtering

5. Growth and properties of radio frequency reactively sputtered titanium nitride thin films

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1. High temperature tribological properties of TiAlSiN/NiCr multilayer coatings with different modulation periods;Ceramics International;2024-07

2. Super-hard and well-tough (TiZrVCrCoNi)Nx high entropy nitride coatings with biphasic nanocomposite structure;Vacuum;2024-06

3. Effects of TiN content and heat treatment on microstructural changes, mechanical strength, and corrosion resistance in selective laser melting of TiN/AISI 420 composites;Materials Science and Engineering: A;2024-05

4. Hardening mechanism of Thick (Ti,Cr,V)N composite coatings with multi-layer nano-columnar dendrites microstructure;Journal of the European Ceramic Society;2024-04

5. Tuning the crystallinity of titanium nitride on copper‐embedded carbon nanofiber interlayers for accelerated electrochemical kinetics in lithium–sulfur batteries;Carbon Energy;2024-01-22

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