What limits the application of TEM in the semiconductor industry?-Reference-Cited by-同舟云学术

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What limits the application of TEM in the semiconductor industry?

Published:1998-05 Issue:1 Volume:320 Page:77-85
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zhang Hong

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. L. Reimer, Transmission electron Microscopy, Physics of Image Formation and Microanalysis, 1982.

2. R.B. Marcus, T.T. Sheng, Transmission Electron Microscopy of Silicon VLSI Circuits and Structure, Wiley, New York, 1983.

3. J.W. Edington, Practical Electron Microscopy in Materials Science, TechBooks, Herdon, VA, 1976.

4. The preparation of cross-section specimens for transmission electron microscopy

5. S. Morris et al., Proceedings of ISTFA, 1991.

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