Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. Extended abstracts of the 40th spring meeting;Hara;Jpn. Soc. Appl. Phys.,1993
2. K. Nakajima, Y. Akasaka, K. Miyano, S. Suehiro, K. Muraoka, I. Kunishima, K. Suguro, in: R.C. Ellwanger, S.Q. Wang (Eds.), Advanced Metallization for ULSI Applications in 1996, p. 317.
3. Comparison of transformation to low-resistivity phase and agglomeration of TiSi/sub 2/ and CoSi/sub 2/
4. Reduction of the C54–TiSi2 phase transformation temperature using refractory metal ion implantation
5. Enhanced formation of the C54 phase of TiSi2 by an interposed layer of molybdenum
Cited by
16 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献