Integrated CVD–PVD Al plug processing for sub-half micron features-Reference-Cited by-同舟云学术

Integrated CVD–PVD Al plug processing for sub-half micron features

Published:1998-05 Issue:1 Volume:320 Page:52-57
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Konecni A,Dixit G,Russell N.M,Luttmer J.D,Havemann R.H

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Z. Xu, H. Kieu, T.Y. Yao, I.J. Raaijmakers, Proc. VMIC, (1994) 158.

2. G.A. Dixit, M.F. Chisholm, M.K. Jain, T. Weaver, L.M. Ting, S. Poarch, K. Mizobuchi, R.H. Havemann, C.D. Dobson, A.I. Jeffryes, P.J. Holverson, P. Rich, D.C. Butler, J. Hems, IEDM Tech. Digest (1994) 105.

3. W.Y. Hsu, G. Dixit, Q.Z. Hong, J.D. Luttmer, R.H. Havemann, Advanced Metallization for ULSI Applications in 1995, (1995) 265.

4. A. Paranjpe, G.A. Dixit, Q.Z. Hong, L.M. Ting, J.D. Luttmer, R.H. Havemann, Advanced Metallization for ULSI Applications in 1995, 1995.

5. R. Fiodalice, Advanced Metallization for ULSI Applications in 1996, 1996, p. 13.

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