Author:
Chae Y.K,Egashira Y,Shimogaki Y,Sugawara K,Komiyama H
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Refractory metal silicides: Thin-film properties and processing technology
2. T. Saito, Y. Yuyama, Y. Egashira, Y. Shimogaki, K. Sugawara, H. Komiyama, Extended Abstracts of the 1992 International Conference on Solid State Device and Materials, The Japan Society of Applied Physics, Tokyo, 1992, pp. 99–101.
3. D.L. Brors et al., Proc. Ninth Int. Conf. on CVD, in: McD. Robinson, C.H.J. van den Brekel, G.W.Cullen, J.M. Blocher, Jr., P. Rai-Choudhury (Eds.), Electrochem. Soc., Cincinnati, OH, 1984, p. 275.
4. Existence of extinction temperature in WSixfilm growth from WF6and SiH4: An indication of the role played by radical chain reactions
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献