Author:
Battiston G.A.,Gerbasi R.,Gregori A.,Porchia M.,Cattarin S.,Rizzi G.A.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference21 articles.
1. Influence of substrate on structural properties of TiO2 thin films obtained via MOCVD
2. G.A. Battiston, R. Gerbasi, M. Guerra, M. Porchia, in: M. Allendorf, C. Bernard (Eds.), Proceedings of the Fourteenth International Conference on Chemical Vapour Deposition/EUROCVD 11, vol. 97-25, The Electrochemical Society, Pennington, 1997, p. 660.
3. Deposition of TiO2 thin films by plasma-enhanced decomposition of tetraisopropyltitanate
4. Preparation and properties of amorphous TiO2 thin films by plasma enhanced chemical vapor deposition
5. Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD
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