Deposition of TiOx and N-TiOx by dielectric barrier discharge at atmospheric pressure-Reference-Cited by-同舟云学术

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Deposition of TiOx and N-TiOx by dielectric barrier discharge at atmospheric pressure

Published:2023-11 Issue: Volume:472 Page:129936
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Chauvin Adrien,Bittencourt Carla,Galais Mathilde,Sauvage Lionel,Bellefroid Maxime,Van Lint Carine,Op de Beeck Anne,Snyders Rony,Reniers François

Funder

European Commission Marie Sklodowska-Curie Actions

FNRS

ULB

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference62 articles.

1. Titanium dioxide: from engineering to applications;Kang;Catalysts,2019

2. Titanium Dioxide Photocatalysis;Fujishima,2000

3. Thin TiO2 films prepared by low pressure chemical vapor deposition;Rausch;J. Electrochem. Soc.,1993

4. Sol–gel preparation and photocatalysis of titanium dioxide;Su;Catal. Today,2004

5. Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry;Ravisy;J. Phys. D. Appl. Phys.,2021

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