Assessment of discharges for large area atmospheric pressure plasma-enhanced chemical vapor deposition (AP PE-CVD)-Reference-Cited by-同舟云学术

Assessment of discharges for large area atmospheric pressure plasma-enhanced chemical vapor deposition (AP PE-CVD)

Published:2003-10 Issue:1-2 Volume:442 Page:36-39
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Engemann J.,Korzec D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Stable glow plasma at atmospheric pressure

2. A. Ignatkov, A. Schwabedissen, G.F. Leu, J. Engemann, International Symposium on High Pressure, Low Temperature Plasma Chemistry HAKONE VIII, Pühajärve, Estonia, July 21–25, 2002, paper P1.3

3. A comparison of polypropylene-surface treatment by filamentary, homogeneous and glow discharges in helium at atmospheric pressure

4. D. Korzec, E.G. Finantu-Dinu, G.L. Dinu, J. Engemann, M. Štefecka, M. Kando, Eighth International Conference on Plasma Surface Engineering PSE 2002, Garmisch-Partenkirchen, September 9–13, 2002

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