Direct patterning in ZnO film formation by surface discharge technique-Reference-Cited by-同舟云学术

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Direct patterning in ZnO film formation by surface discharge technique

Published:2013-12-16 Issue:1 Volume:7 Page:015501
ISSN:1882-0778
Container-title:Applied Physics Express
language:
Short-container-title:Appl. Phys. Express

Author:

Okuya Masayuki,Nabeta Keigo,Shibayama Yoshihiro,Kanezashi Shota,Tan Masato,Iyoda Masahiko,Shikatani Masahiro,Sonohara Yosuke,Yagi Isao

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/7/i=1/a=015501/pdf

Reference23 articles.

1. Air sensitive tin dioxide thin films by magnetron sputtering and thermal oxidation technique

2. Effect of ZnO film deposition methods on the photovoltaic properties of ZnO–Cu2O heterojunction devices

3. Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications

4. Present status and future prospects for development of non- or reduced-indium transparent conducting oxide thin films

5. Low resistivity polycrystalline ZnO:Al thin films prepared by pulsed laser deposition

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1. Microwave heating to form porous TiO2 layer on high-haze FTO film for dye-sensitized solar cell;Materials Science in Semiconductor Processing;2023-08

2. Atmospheric non-equilibrium planar plasma under magnetic field to form a porous-TiO<sub>2</sub> layer for dye-sensitized solar cells;Journal of the Ceramic Society of Japan;2022-03-01

3. Porous TiO2 layer for dye-sensitized solar cell formed with non-equilibrium 2D plasma induced by dielectric barrier discharge under atmospheric pressure;Japanese Journal of Applied Physics;2021-03-17

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