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Porous silicon formation by stain etching

Published:2001-06 Issue:1-2 Volume:388 Page:295-302
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Vázsonyi É,Szilágyi E,Petrik P,Horváth Z.E,Lohner T,Fried M,Jalsovszky G

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. On the Mechanism of Chemically Etching Germanium and Silicon

2. Photoluminescence and formation mechanism of chemically etched silicon

3. A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures

4. Optical and structural investigation of stain‐etched silicon

5. Observation of competing etches in chemically etched porous silicon

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1. Molecular dynamics to model carbon infiltration into a porous silicon matrix: An experimental and computational approach;Computational Materials Science;2024-04

2. Preparation of Mesoporous Si Nanoparticles by Magnesiothermic Reduction for the Enhanced Reactivity;Molecules;2023-04-06

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4. Tribological performance of porous silicon hydrophobic and hydrophilic surfaces;Journal of Materials Research and Technology;2022-07

5. The Effects of a Few Formation Parameters on Porous Silicon Production in HF/HNO3 Using Ag-Assisted Etching and a Comparison with a Stain Etching Method;Silicon;2022-04-11

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