Vibrational properties and structure of undoped and Al-doped ZnO films deposited by RF magnetron sputtering-Reference-Cited by-同舟云学术

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Vibrational properties and structure of undoped and Al-doped ZnO films deposited by RF magnetron sputtering

Published:2000-12 Issue:1-2 Volume:379 Page:28-36
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tzolov M,Tzenov N,Dimova-Malinovska D,Kalitzova M,Pizzuto C,Vitali G,Zollo G,Ivanov I

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference45 articles.

1. Characteristics of zinc oxide thin films prepared by r.f. magnetron-mode electron cyclotron resonance sputtering

2. Film properties of ZnO:Al prepared by cosputtering of ZnO:Al and either Zn or Al targets

3. Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties

4. Growth of ZnO thin films on GaAs by pulsed laser deposition

5. Transparent conducting ZnO thin films prepared on low temperature substrates by chemical vapour deposition using Zn(C5H7O2)2

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