Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique-Reference-Cited by-同舟云学术

Microcrystalline silicon phase in silicon oxide thin films developed by photo-CVD technique

Published:2000-11 Issue:1-2 Volume:376 Page:241-248
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Jana Tapati,Ray Swati

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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