Morphological stability of TiSi2 on polycrystalline silicon
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. VLSI Technology;Ting,1982
2. Development of the Self-Aligned Titanium Silicide Process for VLSI Applications
3. Thermal stability of TiSi2on mono‐ and polycrystalline silicon
4. Cross‐sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus‐doped polycrystalline silicon gate
5. Interfacial reactions of titanium thin films on BF+2‐implanted (001)Si
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