Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Properties of Amorphous Silicon;Veprek,1989
2. Evaporation of Silicon by Vacuum-Arc Discharge
3. Amorphous Si thin films prepared by vacuum arc deposition
4. Proceedings of the Eighth International School on Condensed Matter Physics;Bilek,1994
5. A study of filter transport mechanisms in filtered cathodic vacuum arcs
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1. Effect of defects on wear behavior in ta-C coating prepared by filtered cathodic vacuum arc deposition;Diamond and Related Materials;2020-05
2. Study on nanocrystalline silicon thin films grown by the filtered cathodic vacuum arc technique using boron doped solid silicon for fast photo detectors;Journal of the Taiwan Institute of Chemical Engineers;2018-05
3. Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas;Materials Science in Semiconductor Processing;2015-03
4. Charge state, angular distribution, and kinetic energy of ions from multicomponent-cathodes in vacuum arc devices;Journal of Applied Physics;2014-12-07
5. Study of Phosphorus Doped Micro/Nano Crystalline Silicon Films Deposited by Filtered Cathodic Vacuum Arc Technique;Silicon;2014-10-12
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