Amorphous Si thin films prepared by vacuum arc deposition-Reference-Cited by-同舟云学术

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Amorphous Si thin films prepared by vacuum arc deposition

Published:1994-12 Issue:1-2 Volume:253 Page:62-66
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Arbilly D.,Boxman R.L.,Goldsmith S.,Rothwarf A.,Kaplan L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Materials Issues in Applications of Amorphous Silicon Technology;Hamakawa,1985

2. Macroparticle contamination in cathodic arc coatings: generation, transport and control

3. SnO2 transparent conductor films produced by filtered vacuum arc deposition

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process;Light: Science & Applications;2015-11-12

2. Investigations on phosphorus doped amorphous/nanocrystalline silicon films deposited by a filtered cathodic vacuum arc technique in the presence of hydrogen gas;Materials Science in Semiconductor Processing;2015-03

3. Design of a Dynamic Magnetic Field Steered Cathodic Arc Source in Arc Ion Plating;Advanced Materials Research;2011-09

4. Design and Performance of the Transverse Rotating Magnetic Field Steered Arc Source Used in Vacuum Arc Deposition;Advanced Materials Research;2011-09

5. Vacuum arc deposition devices;Review of Scientific Instruments;2006-02

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