Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition-Reference-Cited by-同舟云学术

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Low temperature synthesis of dense SiO2 thin films by ion beam induced chemical vapor deposition

Published:2001-09 Issue:1-2 Volume:396 Page:9-15
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Barranco A,Yubero F,Cotrino J,Espinós J.P,Benı́tez J,Rojas T.C,Allain J,Girardeau T,Rivière J.P,González-Elipe A.R

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Dielectrics for Field Effect Technology

2. D.L. Griscom, MRS Bull. Jun–Aug. (1987) 20.

3. Advances in deposition processes for passivation films

4. Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor deposition

5. Low temperature oxidation of silicon using a microwave plasma disk source

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