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Transmission electron microscopy study of silicon nitride amorphous films obtained by reactive pulsed laser deposition

  • Published:2001-10 Issue:1-2 Volume:397 Page:12-16
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Teodorescu V.S,Nistor L.C,Popescu M,Mihailescu I.N,Gyorgy E,Van Landuyt J,Perrone A

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Silicon Solar Cells, Advanced Principles and Practice;Green,1995

2. Optical properties of silicon nitride films deposited by hot filament chemical vapor deposition

3. Surface passivation of silicon by rf magnetron-sputtered silicon nitride films

4. D.G. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.

5. Preparation of SiO x N y films by reactive KrF laser ablation
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