Atomic and electronic structures of Cu/a-Al2O3 interfaces prepared by pulsed-laser deposition

Author:

Sasaki Takeo1,Matsunaga Katsuyuki2,Ohta Hiromichi3,Hosono Hideo4,Yamamoto Takahisa5,Ikuhara Yuichi2

Affiliation:

1. Department of Materials Engineering, School of Engineering, The University of Tokyoy, 2-11-16 Yayoi, Bunkyo-ku, Tokyo, 113-8656, Japan

2. Institute of Engineering Innovation, School of Engineering, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo, 113-8656, Japan

3. Hosono Transparent ElectroActive Materials, ERATO, Japan Science and Technology Corporation, KSP C-1232, 3-2-1 Sakado, Takatsu-ku, Kawasaki, 213-0012, Japan

4. Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 226-8503, Japan

5. Department of Advanced Materials Science, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan

Publisher

Informa UK Limited

Subject

General Materials Science

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