New reaction kinetic aspects of the thermal oxidation of sputtered tantalum (nitride) layers-Reference-Cited by-同舟云学术

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New reaction kinetic aspects of the thermal oxidation of sputtered tantalum (nitride) layers

Published:1977-01 Issue:12 Volume:27 Page:635-642
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kolonits VP,Strausz T,Koltai M

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference17 articles.

1. The oxidation of tantalum at 50–300°C

2. R C Petersen, W M Fassel and M E Wadsworth, J Metals (Trans AIME) 200, 1038.

3. A Vacuum Microbalance for the Study of Chemical Reactions on Metals

4. A Spectrophotometric Study of the Oxidation of Tantalum

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxydation du nitrure de tantale par les melanges CO2CO I: Echantillons plans;Journal of the Less Common Metals;1987-10

2. The oxidation of tantalum-based thin films;Thin Solid Films;1985-01

3. Oxydation du nitrure de tantale par l'oxygène;Journal of the Less Common Metals;1983-08

4. Effect of alloying materials on thermal stability and TCR-value of resistor films with Ta-basis;Acta Physica Academiae Scientiarum Hungaricae;1980-08

5. Resistors;Microelectronic Packaging;1979

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