Numerical modelling of gas discharge plasmas for various applications-Reference-Cited by-同舟云学术

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Numerical modelling of gas discharge plasmas for various applications

Published:2002-12 Issue:1-3 Volume:69 Page:37-52
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Bogaerts Annemie,Gijbels Renaat

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference72 articles.

1. Principles of plasma discharges and materials processing;Lieberman,1994

2. Cold plasma in materials fabrication;Grill,1994

3. Plasma discharges for materials processing and display applications;Lieberman,1999

4. Film deposition by plasma techniques;Konuma,1992

5. Bruno G, Capezutto P, Madan A, editors. Plasma deposition of amorphous silicon-based materials. San Diego: Academic Press, 1995.

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