Mo/Si multilayers for EUV lithography by ion beam sputter deposition-Reference-Cited by-同舟云学术

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Mo/Si multilayers for EUV lithography by ion beam sputter deposition

Published:2003-05 Issue:3 Volume:71 Page:407-415
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Chassé T.,Neumann H.,Ocker B.,Scherer M.,Frank W.,Frost F.,Hirsch D.,Schindler A.,Wagner G.,Lorenz M.,Otto G.,Zeuner M.,Rauschenbach B.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference25 articles.

1. Multilayers for high heat load synchrotron applications

2. Reconstructing the Hartley intensity spectrum from its sinusoidal crossings

3. Sub-arcsecond observations of the solar X-ray corona

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5. Influence of shield roughness on Mo/Si defect density for extreme ultraviolet lithography mask blanks;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-07

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